Lou Jost wrote: ↑
Sat Jan 09, 2021 10:43 pm
Such beautiful optical technology.
Yes it is.
I still cant get over the 1080 kg!
Nikon has some awesome displays in Japan. I can just imagine what ASML is working on since Nikon doesn't compete any longer.
The current EUV technology uses reflected light/mirrors.
https://www.asml.com/en/products/euv-li ... n-nxe3400c
From the above:
The NXE:3400C features an all-reflective 4x reduction lens assembly from Zeiss with a maximum exposure field of 26 x 33 mm.
The system is equipped with projection optics with a numerical aperture (NA) of 0.33 and an illuminator with an operating range sigma of 0.06–1 to maintain high productivity while enabling low k1 and a resolution of 13 nm. In-situ measurement and corrections per wafer of the optics and stages enable maximum imaging, overlay and CDU performance for each wafer exposed when imaging at low k1.
03. Imaging performance
The NXE:3400C can achieve a dedicated chuck overlay of 1.4 nm and a matched-machine overlay of 1.5 nm.